Alumina (Al2O3) as Alternate Gate Dielectric in MOS Capacitors als von
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Alumina (Al2O3) as Alternate Gate Dielectric in MOS Capacitors (2017)
DE PB NWISBN: 9783330319165 bzw. 333031916X, in Deutsch, 104 Seiten, LAP Lambert Academic Publishing, Taschenbuch, neu.
Lieferung aus: Deutschland, Versandkosten nach: Deutschland, Versandkostenfrei.
Von Händler/Antiquariat, Sparbuchladen, [3602074].
Neuware - In this book, some fundamental issues regarding the limitation of ultra thin silicon dioxide as gate dielectric are discussed. The scaling limit of silicondioxide and high leakage currents, indicate a need for an alternate gate dielectric to meet the industries demand for greater integrated circuit functionality and performance at lower cost. Alumina fulfills many of the requirements of a high K dielectric for MOS applications. The present book explains the result of growing high quality alumina films on silicon substrate by PLD (pulse laser deposition) to improve the leakage current and breakdown strength. -, 13.06.2017, Taschenbuch, Neuware, 220x150x6 mm, 171g, 104, Internationaler Versand, offene Rechnung (Vorkasse vorbehalten), Selbstabholung und Barzahlung, PayPal, Banküberweisung.
Von Händler/Antiquariat, Sparbuchladen, [3602074].
Neuware - In this book, some fundamental issues regarding the limitation of ultra thin silicon dioxide as gate dielectric are discussed. The scaling limit of silicondioxide and high leakage currents, indicate a need for an alternate gate dielectric to meet the industries demand for greater integrated circuit functionality and performance at lower cost. Alumina fulfills many of the requirements of a high K dielectric for MOS applications. The present book explains the result of growing high quality alumina films on silicon substrate by PLD (pulse laser deposition) to improve the leakage current and breakdown strength. -, 13.06.2017, Taschenbuch, Neuware, 220x150x6 mm, 171g, 104, Internationaler Versand, offene Rechnung (Vorkasse vorbehalten), Selbstabholung und Barzahlung, PayPal, Banküberweisung.
2
Alumina (Al2O3) as Alternate Gate Dielectric in MOS Capacitors (2017)
DE PB NWISBN: 9783330319165 bzw. 333031916X, in Deutsch, 104 Seiten, LAP Lambert Academic Publishing, Taschenbuch, neu.
Lieferung aus: Deutschland, Versandkosten nach: Deutschland, Versandkostenfrei.
Von Händler/Antiquariat, Syndikat Buchdienst, [4235284].
In this book, some fundamental issues regarding the limitation of ultra thin silicon dioxide as gate dielectric are discussed. The scaling limit of silicondioxide and high leakage currents, indicate a need for an alternate gate dielectric to meet the industries demand for greater integrated circuit functionality and performance at lower cost. Alumina fulfills many of the requirements of a high K dielectric for MOS applications. The present book explains the result of growing high quality alumina films on silicon substrate by PLD (pulse laser deposition) to improve the leakage current and breakdown strength. 2017, Taschenbuch / Paperback, Neuware, H: 220mm, B: 150mm, 104, Internationaler Versand, Selbstabholung und Barzahlung, PayPal, offene Rechnung, Banküberweisung.
Von Händler/Antiquariat, Syndikat Buchdienst, [4235284].
In this book, some fundamental issues regarding the limitation of ultra thin silicon dioxide as gate dielectric are discussed. The scaling limit of silicondioxide and high leakage currents, indicate a need for an alternate gate dielectric to meet the industries demand for greater integrated circuit functionality and performance at lower cost. Alumina fulfills many of the requirements of a high K dielectric for MOS applications. The present book explains the result of growing high quality alumina films on silicon substrate by PLD (pulse laser deposition) to improve the leakage current and breakdown strength. 2017, Taschenbuch / Paperback, Neuware, H: 220mm, B: 150mm, 104, Internationaler Versand, Selbstabholung und Barzahlung, PayPal, offene Rechnung, Banküberweisung.
3
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Alumina (Al2O3) as Alternate Gate Dielectric in MOS Capacitors
DE PB NWISBN: 9783330319165 bzw. 333031916X, in Deutsch, Taschenbuch, neu.
Lieferung aus: Deutschland, Versandkostenfrei.
Von Händler/Antiquariat, European-Media-Service Mannheim [1048135], Mannheim, Germany.
Publisher/Verlag: LAP Lambert Academic Publishing | In this book, some fundamental issues regarding the limitation of ultra thin silicon dioxide as gate dielectric are discussed. The scaling limit of silicondioxide and high leakage currents, indicate a need for an alternate gate dielectric to meet the industries demand for greater integrated circuit functionality and performance at lower cost. Alumina fulfills many of the requirements of a high K dielectric for MOS applications. The present book explains the result of growing high quality alumina films on silicon substrate by PLD (pulse laser deposition) to improve the leakage current and breakdown strength. | Format: Paperback | Language/Sprache: english | 104 pp.
Von Händler/Antiquariat, European-Media-Service Mannheim [1048135], Mannheim, Germany.
Publisher/Verlag: LAP Lambert Academic Publishing | In this book, some fundamental issues regarding the limitation of ultra thin silicon dioxide as gate dielectric are discussed. The scaling limit of silicondioxide and high leakage currents, indicate a need for an alternate gate dielectric to meet the industries demand for greater integrated circuit functionality and performance at lower cost. Alumina fulfills many of the requirements of a high K dielectric for MOS applications. The present book explains the result of growing high quality alumina films on silicon substrate by PLD (pulse laser deposition) to improve the leakage current and breakdown strength. | Format: Paperback | Language/Sprache: english | 104 pp.
4
Alumina (Al2O3) as Alternate Gate Dielectric in MOS Capacitors (2017)
DE PB NWISBN: 9783330319165 bzw. 333031916X, in Deutsch, 104 Seiten, LAP Lambert Academic Publishing, Taschenbuch, neu.
Lieferung aus: Deutschland, Versandkosten nach: Deutschland, Versandkostenfrei.
Von Händler/Antiquariat, Buchhandlung Hoffmann, [3174608].
Neuware - In this book, some fundamental issues regarding the limitation of ultra thin silicon dioxide as gate dielectric are discussed. The scaling limit of silicondioxide and high leakage currents, indicate a need for an alternate gate dielectric to meet the industries demand for greater integrated circuit functionality and performance at lower cost. Alumina fulfills many of the requirements of a high K dielectric for MOS applications. The present book explains the result of growing high quality alumina films on silicon substrate by PLD (pulse laser deposition) to improve the leakage current and breakdown strength. 13.06.2017, Taschenbuch, Neuware, 220x150x6 mm, 171g, 104, Internationaler Versand, offene Rechnung (Vorkasse vorbehalten), sofortueberweisung.de, Selbstabholung und Barzahlung, Skrill/Moneybookers, PayPal, Lastschrift, Banküberweisung.
Von Händler/Antiquariat, Buchhandlung Hoffmann, [3174608].
Neuware - In this book, some fundamental issues regarding the limitation of ultra thin silicon dioxide as gate dielectric are discussed. The scaling limit of silicondioxide and high leakage currents, indicate a need for an alternate gate dielectric to meet the industries demand for greater integrated circuit functionality and performance at lower cost. Alumina fulfills many of the requirements of a high K dielectric for MOS applications. The present book explains the result of growing high quality alumina films on silicon substrate by PLD (pulse laser deposition) to improve the leakage current and breakdown strength. 13.06.2017, Taschenbuch, Neuware, 220x150x6 mm, 171g, 104, Internationaler Versand, offene Rechnung (Vorkasse vorbehalten), sofortueberweisung.de, Selbstabholung und Barzahlung, Skrill/Moneybookers, PayPal, Lastschrift, Banküberweisung.
5
Alumina (Al2O3) as Alternate Gate Dielectric in MOS Capacitors (2017)
EN PB NWISBN: 9783330319165 bzw. 333031916X, in Englisch, 104 Seiten, LAP LAMBERT Academic Publishing, Taschenbuch, neu.
Lieferung aus: Deutschland, Versandfertig in 1 - 2 Werktagen, Versandkostenfrei.
Von Händler/Antiquariat, dodax-shop-eu.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
Von Händler/Antiquariat, dodax-shop-eu.
Die Beschreibung dieses Angebotes ist von geringer Qualität oder in einer Fremdsprache. Trotzdem anzeigen
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